ViennaPS-3.5.0

Major Changes

• DirectionEtching changed to DirectionalProcess to allow positive and negative rates
• SF6/O2 etching model has been generalized to a plasma etching model. HBr/O2 etching model was added based on the plasma etching model
• New process models based on rates grid and interpolation

What's Changed

• Add Faraday Cage Etching model to Python GPU models by @tobre1 in #130
• Sputter example and change from DirectionalEtch to DirectionalProcess by @FilipovicLado in #128
• Include PTX files in Python wheel by @tobre1 in #131
• Fix rates grid by @FilipovicLado in #132
• Add DRAM wiggle example and HBrO2 model by @tobre1 in #133

New Contributors

• @FilipovicLado made their first contribution in #128

Full Changelog: v3.4.0...v3.5.0